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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Low Resistance Ohmic Contacts to n-SiC Using...

Low Resistance Ohmic Contacts to n-SiC Using Niobium

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

997-1000

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.997

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Online since:

May 2000

Authors:

T.N. Oder, John R. Williams, K.W. Bryant, M.J. Bozack, John Crofton

Keywords:

Niobium, 'non-reacted' Ohmic Contact, RBS, Specific Contact Resistance, X-Ray Photoelectron Spectroscopy (XPS)

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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