Lowering the Annealing Temperature of Ni/SiC for Ohmic Contacts under N2 Gas, and Application to a UV Sensor

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Periodical:

Materials Science Forum (Volumes 338-342)

Edited by:

Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer

Pages:

989-992

DOI:

10.4028/www.scientific.net/MSF.338-342.989

Citation:

T. Toda et al., "Lowering the Annealing Temperature of Ni/SiC for Ohmic Contacts under N2 Gas, and Application to a UV Sensor", Materials Science Forum, Vols. 338-342, pp. 989-992, 2000

Online since:

May 2000

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$35.00

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