Growth of AlN Films by Hot-Wall CVD and Sublimation Techniques: Effect of Growth Cell Pressure

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Periodical:

Materials Science Forum (Volumes 389-393)

Edited by:

S. Yoshida, S. Nishino, H. Harima and T. Kimoto

Pages:

1469-1472

DOI:

10.4028/www.scientific.net/MSF.389-393.1469

Citation:

A. Kakanakova-Georgieva et al., "Growth of AlN Films by Hot-Wall CVD and Sublimation Techniques: Effect of Growth Cell Pressure", Materials Science Forum, Vols. 389-393, pp. 1469-1472, 2002

Online since:

April 2002

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