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HomeMaterials Science ForumMaterials Science Forum Vols. 389-393Growth of AlN Films by Hot-Wall CVD and...

Growth of AlN Films by Hot-Wall CVD and Sublimation Techniques: Effect of Growth Cell Pressure

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Silicon Carbide and Related Materials 2001

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Periodical:

Materials Science Forum (Volumes 389-393)

Pages:

1469-1472

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.389-393.1469

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Online since:

April 2002

Authors:

A. Kakanakova-Georgieva, Urban Forsberg, Björn Magnusson, Rositza Yakimova, Erik Janzén

Keywords:

Aluminum Nitride (AlN), Cathodoluminescence, Energy Dispersive X-Ray Analysis, Hot-Wall CVD, Infrared Reflectance, Optical Microscopy, Sublimation

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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