Photoelectrochemical Etching Process of 6H-SiC Wafers Using HF-Based Solution and H2O2 Solution as Electrolytes

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Periodical:

Materials Science Forum (Volumes 389-393)

Edited by:

S. Yoshida, S. Nishino, H. Harima and T. Kimoto

Pages:

957-960

DOI:

10.4028/www.scientific.net/MSF.389-393.957

Citation:

J. G. Song and M. W. Shin, "Photoelectrochemical Etching Process of 6H-SiC Wafers Using HF-Based Solution and H2O2 Solution as Electrolytes", Materials Science Forum, Vols. 389-393, pp. 957-960, 2002

Online since:

April 2002

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