Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

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Periodical:

Materials Science Forum (Volumes 433-436)

Edited by:

Peder Bergman and Erik Janzén

Pages:

451-454

DOI:

10.4028/www.scientific.net/MSF.433-436.451

Citation:

H. T. M. Pham et al., "Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films", Materials Science Forum, Vols. 433-436, pp. 451-454, 2003

Online since:

September 2003

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$35.00

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