Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films

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Periodical:

Materials Science Forum (Volumes 433-436)

Edited by:

Peder Bergman and Erik Janzén

Pages:

451-454

Citation:

H. T. M. Pham et al., "Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films", Materials Science Forum, Vols. 433-436, pp. 451-454, 2003

Online since:

September 2003

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[1] P.M. Sarro, Sensors & Actuators A 82 (2000) 210-218.

[2] H.T.M. Pham, C.R. de Boer, L. Pakula, P.M. Sarro, Mat. Sci. For. vols. 389-393(2002), pp.759-762.

[3] F. Demichelis, G. Crovini, C.F. Pirri, E. Tresso, M. Fanciulli, T. Piesarkiewicz, T. Stapinski, Semicond. Sci. Technol. 9(1994) pp.1543-1548.

DOI: https://doi.org/10.1088/0268-1242/9/8/017

[4] W.K. Choi, L.J. Han, F.L. Loo, J. Appl. Phys. 81 (1), (1997), pp.276-280.

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