Surface Structure of Electrochemically Etched α-SiC Substrates

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Materials Science Forum (Volumes 433-436)

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717-720

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September 2003

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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[1] M. Kayambaki and K. Zekentes : Mat. Sci. Forum., 338-342 (2000), p.1061.

Google Scholar

[2] J.S. Shor and R. Osgood, Jr.: J. Electrochem. Soc., 140 (1993), L123.

Google Scholar

[3] M. Kayambaki, K. Zekentes, K. Tsagaraki, E. Pernot and R. Yakimova : Mat. Sci. Forum., 353- 356 (2001), p.619.

DOI: 10.4028/www.scientific.net/msf.353-356.619

Google Scholar

[4] C. Hallin, A. Konstantinov, O. Kordina and E. Janze'n : Inst. Phys. Conf. Ser. 142 (1996), p.85.

Google Scholar

[5] W. Choyke, H. Matsunami and G. Pensl : Sillicon Carbide, John wiley & Sons, New York, (1997). Fig. 7. (a) The AFM image [23µmغ] in etched 4H-SiC and (b) cross sectional profile of A-A.

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