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Surface Mechanisms in Homoepitaxial Growth on α-SiC{0001}-Vicinal Faces

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Periodical:

Materials Science Forum (Volumes 457-460)

Pages:

163-168

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.457-460.163

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Online since:

June 2004

Authors:

Shun-ichi Nakamura, Tsunenobu Kimoto, Hiroyuki Matsunami

Keywords:

{0001}-Vicinal Faces, Atomic Force Microscope (AFM), Chemical Vapor Deposition (CVD), Homoepitaxial Growth, Surface Step Structures

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