Flash Lamp Supported Deposition of 3C-SiC (FLASiC) – a Promising Technique to Produce High Quality Cubic SiC Layers

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Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

175-180

Citation:

W. Skorupa et al., "Flash Lamp Supported Deposition of 3C-SiC (FLASiC) – a Promising Technique to Produce High Quality Cubic SiC Layers", Materials Science Forum, Vols. 457-460, pp. 175-180, 2004

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June 2004

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[1] D. Panknin, J. Stoemenos, M. Eickhoff, V. Heera, N. Vouroutzis, G. Krötz and W. Skorupa: Mat. Sci. Forum, Vol. 353-356 (2001) p.151.

DOI: https://doi.org/10.4028/www.scientific.net/msf.353-356.151

[2] Patents pending for the FLASiC and i-FLASiC processes.

[3] H. Wirth, D. Panknin, W. Skorupa, and E. Niemann: Appl. Phys. Lett. Vol. 74 (1999), P. 979.

[4] The reader is referred to the articles of Ferro et al., Polychroniadis et al., and Smith et al. to get a complete picture of the present state of the art of FLASiC.

[5] T. Chassagne, G. Ferro, D. Chaussende, F. Cauwet, Y. Monteil and J. Bouix: Thin Solid Films Vol. 402 (2002), p.83.

DOI: https://doi.org/10.1016/s0040-6090(01)01597-8

[6] M. Voelskow et al., to be published. Fig. 5 Dependence of the melting depth of silicon in FLASiC structures on the pulse energy density.

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