Relationship between Surface Structures and Aluminium Incorporation Behaviour of SiC in Chemical Vapor Deposition

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Periodical:

Materials Science Forum (Volumes 457-460)

Edited by:

Roland Madar, Jean Camassel and Elisabeth Blanquet

Pages:

739-742

DOI:

10.4028/www.scientific.net/MSF.457-460.739

Citation:

T. Hatayama et al., "Relationship between Surface Structures and Aluminium Incorporation Behaviour of SiC in Chemical Vapor Deposition ", Materials Science Forum, Vols. 457-460, pp. 739-742, 2004

Online since:

June 2004

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$35.00

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