Ultra-Rapid Thermal Process for ULSIs
This paper reports on the ultra-rapid thermal annealing of next generation MOSFETs. In ultra-rapid thermal annealing, the most important issue is to achieve a good balance between electrical activation and impurity diffusion. Another issue of annealing implantation damages is also discussed: Optimized annealing combined with millisecond annealing and conventional halogen lamp annealing is necessary for annealing out defects at end-of range region. Application possibilities of millisecond annealing for deep junction activation and oxidation are also discussed.
W. Lerch and J. Niess
K. Suguro "Ultra-Rapid Thermal Process for ULSIs", Materials Science Forum, Vols. 573-574, pp. 319-324, 2008