Preferred orientation of AlN film has been changed from random to c-axis textured by inserting the ultra-thin Pt/AlN underlayer. The ultra-thin Pt underlayer also exhibits the same effect on the preferred orientation control of AlN film. According to intensity distributions of diffracted X-ray collected as the function of 2θ and ψ on these films, it is clearly shown that c-axis of AlN is altered from titled to the surface normal. AlN film and AlN films with underlayers demonstrate tensile stress, and it can be reduced by inserting underlayers. The effects of underlayers on the development of the preferred orientation and the reduction of stresses are similar to that of decreasing sputtering gas pressure.