Characterization of Triangular-Defects in 4° off 4H-SiC Epitaxial Wafers by Synchrotron X-Ray Topography and by Transmission Electron Microscopy

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Abstract:

We report our investigation results on triangular-defects formed on 4deg. off 4H-SiC epi- taxial wafers. Triangular-defects that had neither down-falls nor basal-plane dislocations previously reported as origins of triangular-defects at the tips of triangle were investigated by TEM. Our TEM results revealed that foreign materials contamination that were different from well-known down- -falls in size and in composition caused one of the defect formations and abnormal domain forma- tions were implied to occur and thought to relate to defect formations. We also report that several types of microstructure existed in the isosceles of defect during dislocation analyses around triangular-defects by X-ray topography.

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[1] T.Hatakeyama, T.Suzuki, K.Ichinoseki, H.Matsuhata, K.Fukuda, T.Shinohe, and K.Arai, Mater. Sci. Forum 645-648(2010)799-804.

DOI: 10.4028/www.scientific.net/msf.645-648.799

Google Scholar

[2] R.A. Berechman, M.Skowronski, and Q.Zhang,J.Appl.Phys 105, 074513(2007).

Google Scholar

[3] Wein Si, Michael Dudley, Hua-Shuang Kong, Joe Sumakeris, and Calvin Carter,Jr.,J.Electron. Mater.Vol.26(1997)151-159.

Google Scholar

[4] T.Okada, T.Kimoto, K.Yamai, H.matsunami, and F.Inoko, Mater.Sci.Eng.A361(2003)67-74.

Google Scholar

[5] T.Okada, T.Kimoto, K.Yamai, H.matsunami, and F.Inoko, Mater.Sci.Forum 457-460 (2004) 521-524.

DOI: 10.4028/www.scientific.net/msf.457-460.521

Google Scholar

[6] G. Feng, J. Suda, and T. Kimoto, Physica B 404 (2009) 4745-4748.

Google Scholar