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Heteroepitaxial CVD Growth of 3C-SiC on Diamond Substrate
Abstract:
This work presents the successful CVD heteroepitaxial growth of 3C-SiC on diamond (100) substrates. When performing a direct SiC growth at 1500°C on such substrate, it leads to polycrystalline deposit. The use of a substrate pretreatment involving silicon deposition allows forming a more continuous and smoother layer. Electron BackScatter Diffraction and Transmission Electron Microscopy all revealed that the 3C-SiC layer grown on the (100) diamond substrate is monocrystalline and well oriented.
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226-229
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Online since:
February 2014
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© 2014 Trans Tech Publications Ltd. All Rights Reserved
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