Heteroepitaxial CVD Growth of 3C-SiC on Diamond Substrate

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Abstract:

This work presents the successful CVD heteroepitaxial growth of 3C-SiC on diamond (100) substrates. When performing a direct SiC growth at 1500°C on such substrate, it leads to polycrystalline deposit. The use of a substrate pretreatment involving silicon deposition allows forming a more continuous and smoother layer. Electron BackScatter Diffraction and Transmission Electron Microscopy all revealed that the 3C-SiC layer grown on the (100) diamond substrate is monocrystalline and well oriented.

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Materials Science Forum (Volumes 778-780)

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226-229

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February 2014

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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