Ion Implantation Induced Sheet Stress due to Defects in Thin (100) Silicon Films

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Periodical:

Materials Science Forum (Volumes 83-87)

Edited by:

Gordon Davies, G.G. DeLeo and M. Stavola

Pages:

1487-1492

DOI:

10.4028/www.scientific.net/MSF.83-87.1487

Citation:

J. Z. Yuan et al., "Ion Implantation Induced Sheet Stress due to Defects in Thin (100) Silicon Films", Materials Science Forum, Vols. 83-87, pp. 1487-1492, 1992

Online since:

January 1992

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$35.00

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