Paper Title:
Ion Implantation Induced Sheet Stress due to Defects in Thin (100) Silicon Films
  Abstract

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Periodical
Materials Science Forum (Volumes 83-87)
Edited by
Gordon Davies, G.G. DeLeo and M. Stavola
Pages
1487-1492
DOI
10.4028/www.scientific.net/MSF.83-87.1487
Citation
J. Z. Yuan, A. J. Yencha, J. W. Corbett, "Ion Implantation Induced Sheet Stress due to Defects in Thin (100) Silicon Films", Materials Science Forum, Vols. 83-87, pp. 1487-1492, 1992
Online since
January 1992
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