Conductance Signal from Near-Interface Traps in n-Type 4H-SiC MOS Capacitors under Strong Accumulation

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Abstract:

We find a clear correlation between the density of near-interface traps (NITs) in n-type 4H-SiC MOS capacitors and the strength of a conductance signal observed under strong accumulation. The conductance signal strength can be described by tunneling of electrons between the SiC conduction band and NITs at a rate close to the ac test signal frequency. The findings here show that the signal in dry thermal oxides depends on temperature which suggests that the electron capture cross section of the NITs is thermally activated. Direct tunneling is more prominent in samples containing low density of NITs such as oxides made by sodium enhanced oxidation (SEO).

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147-150

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May 2017

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© 2017 Trans Tech Publications Ltd. All Rights Reserved

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