Contaminants Removal from Epi Substrates Using Vapor-Laser Process

A. Wachs; S. Zeid; Y. Uziel; W. Huber; J. Krueger

doi:10.4028/www.scientific.net/SSP.103-104.189

Paper Titles

A Comparison of Particle Filtration in a Recirculated Wet Bench Wet Cleaning Tool: Performance of PTFE Filters and of Surface Optimized Filters
p.171

Influences of Oxide Loss on Contamination Removal
p.177

Non-Damaging Particle Removal Using Cryogenic Aerosols
p.181

Laser Cleaning of Particles from Silicon Wafers: Capabilities and Mechanisms
p.185

Contaminants Removal from Epi Substrates Using Vapor-Laser Process
p.189

Chemical Additive Formulations for Particle Removal in SCCO₂-Based Cleaning
p.193

Non-Damaging CO₂ Aerosol Cleaning in FEOL IC Manufacturing
p.199

Particle Adhesion on Tool Kit Part: Case Study for Ceramic Material
p.203

Simultaneous Analysis of Light and Heavy Organic Contamination on Silicon Wafer
p.209

HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104Contaminants Removal from Epi Substrates Using...

Contaminants Removal from Epi Substrates Using Vapor-Laser Process

Abstract:

You might also be interested in these eBooks

Ultra Clean Processing of Silicon Surfaces VII

View Preview

Info:

Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

189-192

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.189

Citation:

Cite this paper

Online since:

April 2005

Authors:

A. Wachs, S. Zeid, Y. Uziel, W. Huber, J. Krueger

Keywords:

Pre-Epitaxial Clean, Steam-Assisted Laser Cleaning

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

Google Scholar

8 1

Google Scholar

[1] 2 >0.3 >1.0 >10.0 LPD Size, microns Normalized LPD Count/Wafer Pre Post 0

Google Scholar

8 1

Google Scholar

[1] 2 >0.3 >1.0 >10.0 LPD Size, microns Normalized LPD Count/Wafer Pre Pos t

Google Scholar