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HomeSolid State PhenomenaSolid State Phenomena Vols. 103-104Non-Damaging CO2 Aerosol Cleaning in FEOL IC...

Non-Damaging CO₂ Aerosol Cleaning in FEOL IC Manufacturing

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Abstract:

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Ultra Clean Processing of Silicon Surfaces VII

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Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

199-202

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.199

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Online since:

April 2005

Authors:

Souvik Banerjee, Andrea Campbell

Keywords:

CO₂ Cryogenic, FEOL Clean, Gate Damage, Metal Contamination, Particle Removal

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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