Co-Solvent Effect on the HF/CO2 Dry Etching of Sacrificial Oxides

Abstract:

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In this work, we studied HF/scCO2 dry etching processes with various co-solvents for the purpose of reducing the residues. The effect of co-solvent on etch rate and selectivity was also investigated.

Info:

Periodical:

Solid State Phenomena (Volumes 145-146)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

235-238

DOI:

10.4028/www.scientific.net/SSP.145-146.235

Citation:

J. H. Bae et al., "Co-Solvent Effect on the HF/CO2 Dry Etching of Sacrificial Oxides", Solid State Phenomena, Vols. 145-146, pp. 235-238, 2009

Online since:

January 2009

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Price:

$35.00

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