Co-Solvent Effect on the HF/CO2 Dry Etching of Sacrificial Oxides
In this work, we studied HF/scCO2 dry etching processes with various co-solvents for the purpose of reducing the residues. The effect of co-solvent on etch rate and selectivity was also investigated.
Paul Mertens, Marc Meuris and Marc Heyns
J. H. Bae et al., "Co-Solvent Effect on the HF/CO2 Dry Etching of Sacrificial Oxides", Solid State Phenomena, Vols. 145-146, pp. 235-238, 2009