Radiation Defects in Silicon: Effect of Contamination by Platinum Atoms

Article Preview

Abstract:

The influence of platinum contamination on the stability of radiation defects produced by high-energy proton irradiation was investigated in the low-doped n-type float-zone oxygen rich silicon forming the base of power p+nn+ diodes. Platinum was first implanted and then in-diffused at different temperatures to obtain different levels of contamination. Diodes were then implanted with 1.8 MeV protons to a fluence of 2x1010 cm-2 and radiation defect reaction during isochronal annealing were investigated by deep-level transient spectroscopy. Results show that contamination of silicon by platinum atoms influences significantly both the introduction rates and the temperature stability of dominant radiation defects (vacancy-oxygen pairs, divacancies and VOH complexes).

You might also be interested in these eBooks

Info:

Periodical:

Solid State Phenomena (Volumes 156-158)

Pages:

167-172

Citation:

Online since:

October 2009

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] J. Vobecký, P. Hazdra: IEEE Electron Device Letters 23 (2002), p.392.

Google Scholar

[2] Y.M. Weng, E. Ohta, M. Sakata: J. Appl. Phys. 65 (1989), p.515.

Google Scholar

[3] M.O. Aboelfotoh, B.G. Svensson: Phys. Rev. B 52 (1995) p.2522.

Google Scholar

[4] V.P. Markevich, A.R. Peaker, I.F. Medvedeva, V.E. Gusakov, L.I. Murin, B. G. Svensson: Solid State Phenomena Vols. 131-133 (2008) p.363.

DOI: 10.4028/www.scientific.net/ssp.131-133.363

Google Scholar

[5] F.P. Korshunov, I.F. Medvedeva, L. I. Murin, V. P. Markevich: Inorganic Materials 43 (2007) p.1153.

Google Scholar

[6] P. Hazdra, V. Komarnitskyy, V. Buršíková: Mater. Sci. Eng. B 159-160 (2009), p.342.

Google Scholar

[7] P. Hazdra, V. Komarnitskyy: IET Circuits Devices Syst. 1 (2007), p.321.

Google Scholar

[8] M.S. Yunusov, M. Karimov, M. Alikulov, A. Akhmadaliev, B.L. Oksengendler, S.S. Sabirov: Semiconductors 31 (1997), p.618.

Google Scholar