Dislocation Nucleation in Heteroepitaxial Semiconducting Films

Abstract:

The nucleation of dislocation in semiconductors is still a matter of debate and especially in heteroepitaxial films. To understand this nucleation process the classical models of dislocation nucleation are presented and discussed. Two main points are then developed: emission of dislocations from surface steps and the role of point defects agglomeration on dislocation nucleation. Recent atomic simulation of half loops emission from surface steps and experimental evidences of anisotropic relaxation of GaInAs films deposited on vicinal (111) GaAs substrates strongly support surface steps as preferential sites for nucleation. In low temperature buffer layer structures (SiGe/Si) an original dislocation structure is observed which corresponds to the dislocation emission in different glide systems by a unique nucleation centre.

• Periodical: Solid State Phenomena (Volumes 156-158)
• Pages: 251-259
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.156-158.251
• Online since: October 2009
• Authors: Bernard Pichaud, N. Burle, Michael Texier, C. Fontaine, V.I. Vdovin
• Keywords: Dislocation, Film Relaxation, GaInAs Alloys, Heteroepitaxy, Nucleation, Semiconductor, SiGe Alloys

References

[1] J.P. Hirth and J. Lothe : Theory of Dislocations (Wiley -Interscience Publication, New York Chichester Brisbane Toronto Singapore 1982).

[2] E. Kasper, H. J. Herzog and H. Kibbel, Appl. Phys. 8 (1975), p.199.

[3] J.C. Bean, L. C. Feldman, A. T. Fiory, S. Nakahara and I. K. Robinson, J. Vac. Sci. Technol. A 2 (1984), p.436.

[4] M. Putero, N. Burle and B. Pichaud, Phil. Mag. Letters, 81 (2001), p.519.

[5] J.W. Matthews and A.E. Blakeslee, J. Cryst. Growth, 27 (1974) , p.118.

[6] J.W. Matthews, Phil. Mag. 13 (1966) , p.1207.

[7] B. Pichaud, N. Burle, M. Putero-Vuaroqueaux and C. Curtil, J. Phys.: Condens. Matter, 14 (2002) , p; 13255.

DOI: 10.1088/0953-8984/14/48/376

[8] J.W. Matthews, J. Vac. Sci. Technol., 12 (1975) , p.126.

[9] D.J. Eaglesham, E.P. Kvam, D.M. Maher, C.J. Humphreys and J.C. Bean, Phil. Mag. A, 59 (1989) , p.1059.

[10] D.D. Perovic, G.C. Weatherly, J. -M. Baribeau and D.C. Houghton., Thin solid films, 183 (1989) , p.141.

DOI: 10.1016/0040-6090(89)90439-2

[11] D.D. Perovic and D.C. Houghton., Mat. Res. Soc. Symp. Proc., 263 (1992) , p.391.

[12] J. Godet, L. Pizzagalli, S. Brochard and P. Beauchamp, Phys. Rev. B, 70 (2004) , p.054109.

[13] J. Godet, L. Pizzagalli, S. Brochard and P. Beauchamp, Comput. Mat. Sci., 30 (2004) , p.16.

[14] J. Godet, P. Hirel, S. Brochard and L. Pizzagalli, Phys. Stat. Sol (a) to be published.

[15] A. S. B. S. G. Roberts and P. B. Hirsch, Mater. Sci. Eng., A176 (1994) , p.91.

[16] J. Rabier, P. Cordier, J. L. Demenet and H. Garem, Mater. Sci. Eng., A309-310 (2001) , p.74.

[17] M. S. Duesbury, B. Joos and D. J. Michel, Phys. Rev. B, 43 (1991) , p.5143.

[18] M. Heggie and R. Jones, Phil. Mag. B, 48 (1983) , p.365.

[19] T. E. Mitchell and O. Unal, J. Electron. Mater., 20 (1991) , p.723.

[20] A. Sacedon, F. Calle, A. L. Alvarez, E. Munoz, R. Beanland and P. Goodhew, Appl. Phys. Lett. , 65 (1994) , p.3212.

[21] S. P. Edirisinghe and A. E. Staton-Bevan, J. Appl. Phys., 82 (1997) , p.4870.

[22] P. Pirouz, Scripta Met., 21 (1987) , p.1463.

[23] D. W. Pashley; J. Cryst. Growth, 162 (1996) , p.178.

[24] A.P. Knights, R. M. Gwilliams, B. J. Sealy, T. J. Grasby, C. P. Parry, D. J. F. Fulgoni, P. J. Phillips, T. E. Whall, E. H. C. Parker and P. G. Colemanet, J. Appl. Phys., 89 (2001) , p.76.

[25] T. Ueno, T. Irisawa and Y. Shiraki, J. Cryst. Growth, 227 (2001) , p.761.

[26] E. Kasper and K. Lyutovich, Solid State Phenom., 108-109 (2005) , p.797.

[27] N. Burle, B. Pichaud, V. I. Vdovin and M. M. Rzaev, Solid State Phenom., 131-133 (2007), p.77.

[28] V.I. Vdovin, T.G. Yugova, M.M. Rzaev, F. Schäffler, and M.G. Mil'vidskii, Phys. Stat. Sol. (c) 2 (2005) , p. (1938).

[29] R. Hull, E.A. Stach, R. Tromp, F. Ross, and M. Reuter, Phys. Stat. Sol. (a), 171 (1999) , p.133.