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HomeSolid State PhenomenaSolid State Phenomena Vols. 19-20Behavior of Implanted Nitrogen in Si with the...

Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO₂ Precipitates

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Periodical:

Solid State Phenomena (Volumes 19-20)

Pages:

405-410

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.19-20.405

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Online since:

January 1991

Authors:

A.B. Danilin, K.A. Drakin, A.A. Malinin, V.N. Mordkovich, A.F. Petrov, O.I. Vyletalina

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© 1991 Trans Tech Publications Ltd. All Rights Reserved

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