Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO2 Precipitates

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Periodical:

Solid State Phenomena (Volumes 19-20)

Edited by:

M. Kittler and H. Richter

Pages:

405-410

DOI:

10.4028/www.scientific.net/SSP.19-20.405

Citation:

A.B. Danilin et al., "Behavior of Implanted Nitrogen in Si with the Buried Layer of SiO2 Precipitates", Solid State Phenomena, Vols. 19-20, pp. 405-410, 1991

Online since:

January 1991

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$35.00

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