Formation of Single and Double Donor States of Trivacancy-Oxygen Complexes in P-Type Silicon

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Deep level transient spectroscopy (DLTS) has been applied to study the formation of trivacancy-oxygen complexes in Si. Samples of p-type Czochralski grown (Cz) silicon, with a boron doping concentration of ~1x1015 cm-3, have been irradiated at room temperature (RT) with 1.8 MeV protons to a dose of 5×1012 cm-2. Two new energy levels at Ev+0.24 eV and Ev+0.11 eV (Ev denotes the valence band edge) emerge when the divacancy (V2) to divacancy-oxygen (V2O) transition takes place during post-irradiation annealing. The concentration is ~30% relative to V2 (or V2O) and further, the two new levels exhibit an almost one-to-one correlation in strength. The present results strongly support that both levels are related to the same defect with a possible identification as single and double donor states of V3O.

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Solid State Phenomena (Volumes 205-206)

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213-217

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October 2013

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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