Infrared Defect Dynamics of Irradiation Induced Complexes in CZ Silicon - C-Rich Case

Article Preview

Abstract:

Irradiation induced complexes of C-rich case in silicon crystal were examined by the highly sensitive and accurate infrared absorption spectroscopy. Low impurity concentration and high quality crystal was used and low dose was employed to make the reaction simple. Almost all possible absorption lines were revealed and their absorbance determined. The conversion coefficient from absorbance to the complex concentration was estimated by the plausible assumptions. The reaction was discussed in terms of concentration rather than absorbance. Intra-group reaction, chain reaction of successive addition of oxygen or self-interstitial, reaction yield and competition between the parallel reactions were described.

You might also be interested in these eBooks

Info:

Periodical:

Solid State Phenomena (Volumes 205-206)

Pages:

228-233

Citation:

Online since:

October 2013

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2014 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] N Inoue Y. Goto, T. Sugiyama, Y. Kawamura, Infrared measurement and irradiation of ultra low carbon concentration silicon crystal, physica status solidi (c) 9 (2012) 1931-(1936).

DOI: 10.1002/pssc.201200080

Google Scholar

[2] Y. Yonezawa, N. Inoue, Y. Takubo, Y. Goto, T. Sugiyama, Y. Kawamura, T. Takeguchi, Estimation of radiation-induced complex concentration in CZ-Si by IR absorption spectroscopy, in: High Purity Silicon 10, The Electrochemical Society, Pennington, 2008, pp.343-350.

DOI: 10.1149/1.2980317

Google Scholar

[3] for example, H. Hirata and N. Inoue, Improvement of thermal symmetry in CZ Si melts by the application of a vertical magnetic field, Journal of Crystal Growth, 70 (1984) 330-334.

DOI: 10.1016/0022-0248(84)90283-5

Google Scholar

[4] N. Inoue, Y. Goto, T. Sugiyama, Infrared absorption from low carbon concentration, low dose, annealed CZ silicon, Solid State Phenomena 131-133 (2007) 207-212.

DOI: 10.4028/www.scientific.net/ssp.131-133.207

Google Scholar

[5] J. L. Lindstroem, L. I. Murin, V. P. Markevich, T. Hallberg, and B. G. Svensson, Vibrational absorption from vacancy-oxygen-related complexes (VO, V2O, VO2) in irradiated silicon, Physica B, 273-274 (1999) 291-295.

DOI: 10.1016/s0921-4526(99)00447-0

Google Scholar

[6] J. L. Lindstroem, L. I. Murin, B. G. Svensson, V. P. Markevich and T. Hallberg, The VO2* defect in silicon, Physica B, 340-342 (2003) 509-513.

DOI: 10.1016/j.physb.2003.09.146

Google Scholar

[7] L. I. Murin, V. P. Markevich, J. L. Lindstroem, M. Kleverman, J. Hermansson, T. Hallberg and B. G. Svensson, Carbon-oxygen-related complexes in irradiated and heat-treated silicon: IR absorption studies, Solid State Phenomena, 82-84 (2002) 57-62.

DOI: 10.4028/www.scientific.net/ssp.82-84.57

Google Scholar

[8] H. Yamada-Kaneta, Y. Shirakawa and C. Kaneta, in R. Jones (Ed) Proc. NATO Advanced Workshop on the Early Stages of Oxygen Precipitation in Silicon, NATO ASI Ser. 3, High technology, Vol. 17, Kluver Academic Publishers, Dordrecht, 1996, pp.389-396.

DOI: 10.1007/978-94-009-0355-5_26

Google Scholar

[9] L. I. Murin, J. L. Lindstroem, G. Davies and V. P. Markevich, Evolution of radiation-induced carbon-oxygen-related defects in silicon upon annealing: LVM studies, Nucl. Instr. and Meth. In Phys. B 253 (2006) 210-213.

DOI: 10.1016/j.nimb.2006.10.029

Google Scholar

[10] J. L. Lindstroem, T. Hallberg, J. Hermansson, L. I. Murin, V. P. Markevich, M. Kleverman and B. G. Svensson, Oxygen and carbon clustering in Cz-Si during electron irradiation at elevated temperatures, Solid State Phenomena, 69-70 (1999) 297-302.

DOI: 10.4028/www.scientific.net/ssp.69-70.297

Google Scholar

[11] A. S. Oates and R. C. Newman, Involvement of oxygen-vacancy defects in enhancing oxygen diffusion in silicon, Appl. Phys. Lett. 49 (1986) 262-264.

DOI: 10.1063/1.97190

Google Scholar

[12] G. Davies, E. C. Lightowlers, R. C. Newman and A. S. Oates, A model for radiation damage effects in carbon-doped crystalline silicon, Semicond. Sci. Technol. 2 (1987) 524-532.

DOI: 10.1088/0268-1242/2/8/009

Google Scholar