Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Rikiichi Ohno; Koichiro Saga

doi:10.4028/www.scientific.net/SSP.282.309

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Influence of VPT Treatment on Microscopic Distribution of Trace Metal Contaminants and its Effect on TXRF Measurement

Abstract:

We have found that to the detection sensitivity of Total reflection X-ray fluorescent spectrometry (TXRF), the total volume of trace particles generated by vapor phase treatment (VPT) must be increased and metal atoms need to be included in the particles. The detection sensitivity for Cu is enhanced by assisting Cu ionization in the liquid drops condensed form the vapor. We consider that since incident and reflected X-rays resonate 30nm from the surface, the total reflection intensity of metals included in the particles is enhanced.

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Periodical:

Solid State Phenomena (Volume 282)

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309-313

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.282.309

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Online since:

August 2018

Authors:

Rikiichi Ohno, Koichiro Saga*

Keywords:

Metallic Contamination, TXRF, Vapor Phase

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