Preface
Selected Properties of Hydrogenated Amorphous Silicon and Silicon-Carbon Alloys
p.3
p.3
On the Atomic Structure of Amorphous Semiconductors
p.25
p.25
Physics of Device Grade Amorphous Silicon
p.41
p.41
Very High Frequency Glow Discharge: Plasma- and Deposition Aspects
p.97
p.97
Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties
p.127
p.127
Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma
p.135
p.135
Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma
p.181
p.181
Ellipsometric Studies of a-Si:H Film Growth, Density and Microstructure
p.195
p.195
On the Atomic Structure of Amorphous Semiconductors
Abstract:
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Periodical:
Solid State Phenomena (Volumes 44-46)
Pages:
25-40
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Online since:
July 1995
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© 1995 Trans Tech Publications Ltd. All Rights Reserved
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