Paper Titles

Selected Properties of Hydrogenated Amorphous Silicon and Silicon-Carbon Alloys
p.3

On the Atomic Structure of Amorphous Semiconductors
p.25

Physics of Device Grade Amorphous Silicon
p.41

Very High Frequency Glow Discharge: Plasma- and Deposition Aspects
p.97

Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties
p.127

Growth of Hydrogenated Amorphous Silicon in Electron Cyclotron Resonance Plasma
p.135

Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma
p.181

Ellipsometric Studies of a-Si:H Film Growth, Density and Microstructure
p.195

Plasma Kinetics, Surface Phenomena and Growth Mechanism in Hydrogenated Amorphous Silicon: Transition from Amorphous to Micro- and Nano-Crystalline Si:H
p.227

HomeSolid State PhenomenaSolid State Phenomena Vols. 44-46Hydrogen-Plasma Treated CVD Amorphous Silicon:...

Hydrogen-Plasma Treated CVD Amorphous Silicon: Growth and Properties

Article Preview

Abstract:

You might also be interested in these eBooks

Hydrogenated Amorphous Silicon

Info:

Periodical:

Solid State Phenomena (Volumes 44-46)

Pages:

127-134

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.44-46.127

Citation:

Cite this paper

Online since:

July 1995

Authors:

I. Sakata, Mitsugu Yamanaka, Toshihiro Sekigawa, Yoshikazu Hayashi

Keywords:

a-Si:H, Chemical Vapor Deposition (CVD), Hydrogen Plasma Treatments, Light-Induced Changes

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 1995 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: