Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma

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Periodical:

Solid State Phenomena (Volumes 44-46)

Edited by:

Hans Neber-Aeschbacher

Pages:

181-194

DOI:

10.4028/www.scientific.net/SSP.44-46.181

Citation:

M. Heintze "Diagnostics of High-Rate a-Si:H Deposition in a Variable Frequency Plasma", Solid State Phenomena, Vols. 44-46, pp. 181-194, 1995

Online since:

July 1995

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$35.00

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