Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry

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Periodical:

Solid State Phenomena (Volumes 51-52)

Edited by:

S. Pizzini, H.P. Strunk and J.H. Werner

Pages:

179-186

DOI:

10.4028/www.scientific.net/SSP.51-52.179

Citation:

L. Asinovsky et al., "Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry", Solid State Phenomena, Vols. 51-52, pp. 179-186, 1996

Online since:

May 1996

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$35.00

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