Substrate Material for sub-0.25µm Si Technology Comparison of Hydrogen Annealed Wafers and Challengers: Evidence for Dopant Enhanced Diffusion

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Periodical:

Solid State Phenomena (Volumes 69-70)

Edited by:

H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter

Pages:

577-582

DOI:

10.4028/www.scientific.net/SSP.69-70.577

Citation:

M.T. Bostelmann and B. Leroy, "Substrate Material for sub-0.25µm Si Technology Comparison of Hydrogen Annealed Wafers and Challengers: Evidence for Dopant Enhanced Diffusion", Solid State Phenomena, Vols. 69-70, pp. 577-582, 1999

Online since:

August 1999

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$35.00

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