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HomeSolid State PhenomenaSolid State Phenomena Vols. 76-77SC-1 Clean Improvements for Post STI CMP

SC-1 Clean Improvements for Post STI CMP

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Abstract:

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Ultra Clean Processing of Silicon Surfaces V

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Periodical:

Solid State Phenomena (Volumes 76-77)

Pages:

291-294

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.76-77.291

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Online since:

January 2001

Authors:

Kenneth McAvey, Andrew Hoadley, Chad Binkerd

Keywords:

CMP Cleaning, Megasonics, STI

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Сopyright:

© 2001 Trans Tech Publications Ltd. All Rights Reserved

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