The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volumes 76-77)

Edited by:

Marc Heyns, Marc Meuris and Paul Mertens

Pages:

307-310

DOI:

10.4028/www.scientific.net/SSP.76-77.307

Citation:

S. J. Kirk and R. Small, "The Effect of DI Water and Intermediate Rinse Solutions on Post Metal Etch Residue Removal Using Semi-Aqueous Cleaning Chemistries", Solid State Phenomena, Vols. 76-77, pp. 307-310, 2001

Online since:

January 2001

Export:

Price:

$35.00

In order to see related information, you need to Login.