Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
p.147
p.147
A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
p.151
p.151
Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
p.157
p.157
Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
p.161
p.161
TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
p.165
p.165
Forced Vapour-Phase Decomposition (FVPD) in Combination with e.g. TXRF - a Method to Determine Contamination in Silicon
p.171
p.171
On-Tool Real-Time Moisture Monitoring Provides Yield and Productivity Benefits
p.175
p.175
Effect of Preparation-Induced Surface Morphology on the Stability of H-Terminated Si(111) and Si(100) Surfaces
p.179
p.179
Thermal Evolution of (100) Silicon and Chemical Oxides as Seen by ATR Spectroscopy
p.183
p.183
TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
Abstract:
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Periodical:
Solid State Phenomena (Volume 92)
Pages:
165-170
Citation:
Online since:
May 2003
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Сopyright:
© 2003 Trans Tech Publications Ltd. All Rights Reserved
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