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Effect of Transient pH on Particle Deposition during Immersion Rinsing
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Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
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Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
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A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
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Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
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Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
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TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
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Forced Vapour-Phase Decomposition (FVPD) in Combination with e.g. TXRF - a Method to Determine Contamination in Silicon
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HomeSolid State PhenomenaSolid State Phenomena Vol. 92A Theoretical and Experimental Study of...

A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

151-156

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.151

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Online since:

May 2003

Authors:

Jeffrey M. Lauerhaas, Yi Wu, Mario Bran, Brian Fraser, Eric Brause, Tom Nicolosi

Keywords:

Boundary Layer, Megasonic, Single Wafer

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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