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A Comprehensive Model for Cleaning Semiconductor Wafers
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Effect of Transient pH on Particle Deposition during Immersion Rinsing
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Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
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Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
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A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Influence of Hardware and Chemistry on the Removal...

Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

143-146

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.143

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Online since:

May 2003

Authors:

Guy Vereecke, Marc Heyns, Rita Vos, M. Schmidt, Frank Holsteyns, M. Baeyens, S. Gomme, James Snow, Paul W. Mertens, V. Coenen, T. Bauer

Keywords:

APM, Megasonics, Particle Removal, Wet Cleaning

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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