Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

157-160

DOI:

10.4028/www.scientific.net/SSP.92.157

Citation:

A. Eitoku et al., "Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool", Solid State Phenomena, Vol. 92, pp. 157-160, 2003

Online since:

May 2003

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$35.00

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