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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Removal of Small (<100-nm) Particles and Metal...

Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

157-160

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.157

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Online since:

May 2003

Authors:

Atsuro Eitoku, Rita Vos, James Snow, M. Sato, S. Hirae, Kazuo Nakajima, M. Nonomura, M. Imai, Paul W. Mertens, Marc Heyns

Keywords:

Cleaning, Metal Contamination, Oxide Loss, Particle Removal, Single Wafer

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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