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HomeSolid State PhenomenaSolid State Phenomena Vol. 92Selective Wet Etching of High-k Gate Dielectrics

Selective Wet Etching of High-k Gate Dielectrics

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Ultra Clean Processing of Silicon Surfaces VI

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Periodical:

Solid State Phenomena (Volume 92)

Pages:

129-131

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.92.129

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Online since:

May 2003

Authors:

Kurt K. Christenson, Brent Schwab, Thomas J. Wagener, Bruce Rosengren, Deborah J. Riley, Joel Barnett

Keywords:

Etch, HfO₂, High-k, Silicate, Zro₂

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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