Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment

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Periodical:

Solid State Phenomena (Volume 92)

Edited by:

Marc Heyns, Paul Mertens and Marc Meuris

Pages:

85-88

DOI:

10.4028/www.scientific.net/SSP.92.85

Citation:

S. Y.M. Chooi et al., "Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment", Solid State Phenomena, Vol. 92, pp. 85-88, 2003

Online since:

May 2003

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$35.00

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