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Epitaxial Growth Due to Phase Separation of Disordered Eutectic Au:Si Alloys on Silicon
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Self-Assembled Surface Patterning and Structural Modification upon Femtosecond Laser Processing of Crystalline Silicon
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Local Dielectric Degradation of Cu-Contaminated SiO₂ Thin Films
p.641

Process-Induced Changes of the Properties of Silicon Oxide Layers Containing Carbon: A Study of a Low-k Material to be Used in the Interconnection System
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Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer
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HomeSolid State PhenomenaSolid State Phenomena Vols. 95-96Local Dielectric Degradation of Cu-Contaminated...

Local Dielectric Degradation of Cu-Contaminated SiO₂ Thin Films

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Gettering and Defect Engineering in Semiconductor Technology X

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Periodical:

Solid State Phenomena (Volumes 95-96)

Pages:

641-646

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.95-96.641

Citation:

Cite this paper

Online since:

September 2003

Authors:

Norio Tokuda, Shingo Nishiguchi, Satoshi Yamasaki, Kazushi Miki, Kikuo Yamabe

Keywords:

Contamination, Copper (Cu), Dielectric Breakdown, Leakage Current, Silicon, Silicon Dioxide

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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