Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer

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Periodical:

Solid State Phenomena (Volumes 95-96)

Edited by:

H. Richter and M. Kittler

Pages:

653-658

DOI:

10.4028/www.scientific.net/SSP.95-96.653

Citation:

D. Wolfframm et al., "Hafnium Oxide on Silicon: A Non-Destructive Characterization of the Interfacial Layer", Solid State Phenomena, Vols. 95-96, pp. 653-658, 2004

Online since:

September 2003

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$35.00

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