Polycrystalline Semiconductors V
Solid State Phenomena Volumes 67 - 68
doi:10.4028/www.scientific.net/SSP.67-68
-
p119
Low-Temperature Deposition of Microcrystalline Silicon by Microwave Plasma-Enhanced Sputtering
[
427 K
]
Authors: P. Müller, W.M. Holber, W. Henrion, E. Nebauer, Viktor Schlosser, B. Selle, Irina Sieber, W. Fuhs
-
p125
Influence of Deposit Thickness on the Microstructure and Surface Roughness of Silicon Films Deposited from Silane
[
491 K
]
Authors: B. Caussat, J.P. Couderc, L. Vasquez, A. Figueras, A. Vander Lee, D. Cot, Jean Durand, V. Paillard, E. Scheid, B. Legros-de Mauduit, A. Vilà, J.R. Morante
-
p131
Adaptation of Microelectronics Simulator to the Polycrystalline Silicon Technology
[
344 K
]
Authors: T. Gaillard, H. Lhermite, O. Bonnaud, R. Rogel
-
p137
Thickness Control of the Amorphous Buffer Layer of Hydrogenated Nanocrystalline Silicon: Effect of the Dopant Concentration
[
280 K
]
Authors: F. Gourbilleau, A. Achiq, P. Voivenel, Richard Rizk
-
p143
Structure Dependence of the Electrical Conductivity of Hydrogenated Nanocrystalline Silicon Films
[
313 K
]
Authors: A. Achiq, Richard Rizk, F. Gourbilleau, P. Voivenel, B. Garrido, J.L. Pérez-Rodríguez, J.R. Morante
-
p149
Highly Doped Microcrystalline SiGe Films: Structure and Transport Properties
[
274 K
]
Authors: F. Edelman, T. Raz, Y. Komem, M. Stölzer, P. Zaumseil
-
p155
Photoluminescence Measurements of Microcrystalline Silicon
[
204 K
]
Authors: M. Meister, Joerg Weber, M. Furtsch, H. Muenzel
-
p161
Silicon Produced by Thermal Chemical Vapour Deposition on Ceramic Substrates for Photovoltaic Applications
[
335 K
]
Authors: A.J.M.M. Van Zutphen, A. Von Keitz, M. Zeman, J.W. Metselaar
-
p169
Grain Matrix Made with Excimer-Laser Crystallization of Thin Silicon Films
[
491 K
]
Authors: P.Ch. Van der Wilt, Ryoichi Ishihara
-
p175
Grain Boundary Location Control by Patterned Metal Film in Excimer Laser Crystallized Polysilicon
[
673 K
]
Authors: L. Mariucci, R. Carluccio, A. Pecora, G. Fortunato, F. Massussi, V. Foglietti, D. Della Sala, J. Stoemenos
-
p181
Characterisation of Excimer Laser Crystallised Polysilicon by X-Ray Diffraction and by Channeling Contrast in a Scanning Electron Microscope
[
355 K
]
Authors: S. Loreti, M. Vittori, L. Mariucci, G. Fortunato
-
p187
Multicrystalline Silicon Thin Films: Laser Crystallization Conditions and Properties
[
627 K
]
Authors: G. Andrä, J. Bergmann, Fritz Falk, E. Ose, N.D. Sinh
-
p193
Laser-Crystallized Polycrystalline Silicon on Glass for Photovoltaic Applications
[
327 K
]
Authors: R. Dassow, J.R. Köhler, M. Grauvogl, R.B. Bergmann, Jens Werner
-
p199
Properties of Poly-Si Obtained by Solid Phase Crystallization of Differently Produced a:Si:H Thin Films
[
408 K
]
Authors: M.L. Addonizio, P. Delli Veneri, G. Fameli, S. Loreti, C. Minarini, C. Privato, G. Sinno, E. Terzini, M. Vancini
-
p205
Transmission Electron Microscopy and Raman Analysis of the Crystallisation Process of a-Si on Glass for Low Seed Density
[
699 K
]
Authors: J.L. Alay, A. Vilà, J.M. Morante, T. Mohammed-Brahim, M. Sarret, O. Bonnaud