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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 183-185Diffusion and Electrical Properties of Nickel in...

Diffusion and Electrical Properties of Nickel in Silicon

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Defects and Diffusion in Semiconductors III

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Periodical:

Defect and Diffusion Forum (Volumes 183-185)

Pages:

171-180

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.183-185.171

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Online since:

August 2000

Authors:

S. Tanaka, Tetsuo Ikari, H. Kitagawa

Keywords:

Annealing, Energy Levels, In-Diffusion, Intrinsic Point Defects (IPD), Nickel Ni, Precipitation, Silicon, Sinks, Solubility, Source

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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