Evaluation of Defects in a SiC Substrate Using the Photoluminescence Measurement Method

Article Preview

Abstract:

Photoluminescence (PL) imaging provide defect and dislocation characteristics not only in a 4H silicon carbide (SiC) epilayer but also in a substrate. In this work, to detect a large-pit or a bar-shaped stacking fault (BSF) before epilayer growth, we employed PL under various detection conditions. A large-pit was detected as a dark spot on a 4H-SiC substrate due to dislocations orthogonal to a micropipe. The BSF was clearly observed as a bright rectangle by tuning the observation conditions. The finding indicates that device killing defects or dislocations should be detected as soon as possible and thus improve the yield.

You have full access to the following eBook

Info:

Periodical:

Materials Science Forum (Volume 1062)

Pages:

268-272

Citation:

Online since:

May 2022

Export:

Share:

Citation:

* - Corresponding Author

[1] G. Feng, J. Suda, and T. Kimoto, Appl. Phys. Lett. 92, 221906 (2008).

Google Scholar

[2] C. Kawahara, J. Suda, and T. Kimoto, Jpn. J. Appl. Phys. 53, 020304 (2014).

Google Scholar

[3] Y. Nishihara, K. Kamei, K. Momose, and H. Osawa, Mater. Sci. Forum 963, 272-275 (2019).

Google Scholar

[4] JEITA EDR-4712/100.

Google Scholar

[5] T. Ishigaki, T. Murata, K. Kinoshita, T. Morikawa, T. Oda, R. Fujita, K. Konishi, Y. Mori, A. Shima, Proc. 2019 IEEE 31st ISPSD, 259-262, (2019).

DOI: 10.1109/ispsd.2019.8757598

Google Scholar