Effects of Si3N4 Films on Diffusion of Boron and Extended Defects in Silicon during Post-Implantation Annealing

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Periodical:

Materials Science Forum (Volumes 196-201)

Edited by:

M. Suezawa and H. Katayama-Yoshida

Pages:

1891-1896

DOI:

10.4028/www.scientific.net/MSF.196-201.1891

Citation:

Y. Zaitsu et al., "Effects of Si3N4 Films on Diffusion of Boron and Extended Defects in Silicon during Post-Implantation Annealing", Materials Science Forum, Vols. 196-201, pp. 1891-1896, 1995

Online since:

November 1995

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$35.00

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