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HomeMaterials Science ForumMaterials Science Forum Vols. 264-268Mechanism of Reactive Ion Etching of 6H-SiC in...

Mechanism of Reactive Ion Etching of 6H-SiC in CHF₃/O₂ Gas Mixtures

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Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

825-828

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.264-268.825

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Online since:

February 1998

Authors:

N. Sieber, Jürgen Ristein, Lothar Ley

Keywords:

Etching Model, Reactive Ion Etching, Surface Chemistry

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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