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HomeMaterials Science ForumMaterials Science Forum Vols. 264-268Fast and Anisotropic Reactive Ion Etching of 4H...

Fast and Anisotropic Reactive Ion Etching of 4H and 6H SiC in NF₃

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Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

829-832

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.264-268.829

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Online since:

February 1998

Authors:

V. Saxena, A.J. Steckl

Keywords:

Anisotropy, Etch Rate, NF₃, Reactive Ion Etching, Roughness

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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