Chemical Vapor Deposition of SiC by the Temperature Oscillation Method

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Periodical:

Materials Science Forum (Volumes 353-356)

Edited by:

G. Pensl, D. Stephani and M. Hundhausen

Pages:

81-84

DOI:

10.4028/www.scientific.net/MSF.353-356.81

Citation:

Y.V. Martynov "Chemical Vapor Deposition of SiC by the Temperature Oscillation Method", Materials Science Forum, Vols. 353-356, pp. 81-84, 2001

Online since:

January 2001

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