Characterization of the Interfaces between SiC and Oxide Films by Spectroscopic Ellipsometry

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Periodical:

Materials Science Forum (Volumes 389-393)

Edited by:

S. Yoshida, S. Nishino, H. Harima and T. Kimoto

Pages:

1029-1032

DOI:

10.4028/www.scientific.net/MSF.389-393.1029

Citation:

Y. Tomioka et al., "Characterization of the Interfaces between SiC and Oxide Films by Spectroscopic Ellipsometry", Materials Science Forum, Vols. 389-393, pp. 1029-1032, 2002

Online since:

April 2002

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$35.00

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