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HomeMaterials Science ForumMaterials Science Forum Vols. 389-393Electrical Characteristics of Al+ Ion-Implanted...

Electrical Characteristics of Al⁺ Ion-Implanted 4H-SiC

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Silicon Carbide and Related Materials 2001

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Periodical:

Materials Science Forum (Volumes 389-393)

Pages:

803-806

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.389-393.803

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Online since:

April 2002

Authors:

Hideaki Tanaka, Satoshi Tanimoto, Mitsugu Yamanaka, Masakatsu Hoshi

Keywords:

Al⁺ Ion-Implantation, High Temperature Annealing, Sheet Resistance, Surface Roughness (SR)

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© 2002 Trans Tech Publications Ltd. All Rights Reserved

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