Comparison between Chemical and Electrical Profiles in Al+ or N+ Implanted and Annealed 6H-SiC

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Periodical:

Materials Science Forum (Volumes 389-393)

Edited by:

S. Yoshida, S. Nishino, H. Harima and T. Kimoto

Pages:

811-814

DOI:

10.4028/www.scientific.net/MSF.389-393.811

Citation:

R. Nipoti et al., "Comparison between Chemical and Electrical Profiles in Al+ or N+ Implanted and Annealed 6H-SiC", Materials Science Forum, Vols. 389-393, pp. 811-814, 2002

Online since:

April 2002

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$35.00

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