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HomeMaterials Science ForumMaterials Science Forum Vols. 455-456

Materials Science Forum Vols. 455-456

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456

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Table of Contents

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Paper Title Page

Effect of Annealing on Gold Rectifying Contacts in Amorphous Silicon

Authors: Hugo Águas, Luís Pereira, Isabel Ferreira, A.R. Ramos, A.S. Viana, J. Andreu, Paula M. Vilarinho, Elvira Fortunato, Rodrigo Martins

96

Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz

Authors: Rodrigo Martins, Hugo Águas, Isabel Ferreira, Elvira Fortunato, Leandro Raniero, Pere Roca i Cabarrocas

100

Batch Processing Method to Deposit a-Si:H Films by PECVD

Authors: Leandro Raniero, Hugo Águas, Luís Pereira, Elvira Fortunato, Isabel Ferreira, Rodrigo Martins

104

Influence of the Rapid Thermal Annealing on the Properties of Thin a-Si Films

Authors: N. Nedev, G. Beshkov, Elvira Fortunato, S.S. Georgiev, T. Ivanov, Leandro Raniero, Shibin Zhang, Rodrigo Martins

108

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Authors: Luís Pereira, Hugo Águas, Leandro Raniero, Rui Miguel S. Martins, Elvira Fortunato, Rodrigo Martins

112

Spiral Inductors on Silicon for Wireless Communications

Authors: P.M. Trabulo, D.A. Durães, P.M. Mendes, P.J. Garrido, J. Higino Correia

116

Silicon Etching in CF₄/O₂ and SF₆ Atmospheres

Authors: A. Silva, Leandro Raniero, E. Ferreira, Hugo Águas, Luís Pereira, Elvira Fortunato, Rodrigo Martins

120

Optimisation of a Home-Made RIE System - Effect of SF₆ Plasma on the Properties of Partially Etched a-Si:H Films

Authors: P. Pereira, G. Lavareda, A.M. Botelho do Rego, A. Amaral, C. Nunes de Carvalho

124

Optical and Morphological Properties of Annealed PbS Thin Films Obtained from a Chemical Solution.

Authors: Leandro Raniero, C.L. Ferreira

128

Absolute Scale Reciprocal Space Mapping on X-Ray Diffractometers Incorporating a Position Sensitive Detector: Application to III-Nitride Semiconductors

Authors: Nuno Franco, Sergio Pereira, A.D. Sequeira

132

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